"

Cookies ussage consent

Our site saves small pieces of text information (cookies) on your device in order to deliver better content and for statistical purposes. You can disable the usage of cookies by changing the settings of your browser. By browsing our site without changing the browser settings you grant us permission to store that information on your device.

I agree, do not show this message again.

A NEW LOW FREQUENCY RF PROBE TECHNIQUE FOR ELECTRON DENSITY DETERMINATION IN THE TEMPORAL AFTERGLOW PLASMA

A. Surmeian1,* , C. Diplasu1, I.-Iovitz Popescu1

Affiliation

  1. Institute of Atomic Physics-INFLPR, P.O.Box MG 36, R-76900, Bucharest, Romania

Abstract

The use of classical electric probes for studying plasma parameters of the high voltage pulsed discharges, encounters enormous difficulties. Besides the difficulty of a proper galvanic insulation of the probe required during the high voltage pulse, the probe can exert great influence over the plasma potential by the current that it draws from the plasma. In this paper, we proposed a new method for the determination of the electrical conductivity of the plasma in the afterglow of the high voltage pulsed discharges, using a low frequency RF plane probe. The application of a small low frequency signal to the plane probe could successfully eliminate all the disadvantages mentioned above..

Keywords

Low frequency RF probe, hollow cathode pulsed discharge, Plasma conductivity.

Submitted at: Nov. 11, 2005
Accepted at: Nov. 24, 2005

Citation

A. Surmeian, C. Diplasu, I.-Iovitz Popescu, A NEW LOW FREQUENCY RF PROBE TECHNIQUE FOR ELECTRON DENSITY DETERMINATION IN THE TEMPORAL AFTERGLOW PLASMA, Journal of Optoelectronics and Advanced Materials Vol. 7, Iss. 6, pp. 3191-3195 (2005)