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I agree, do not show this message again.AIIBVI PHOTORESISTANCES BY SINTERING-SUBLIMATION TECHNICS
I. Nazarenco1,* , J. Jaklovszky1, V. Ghiordnescu1, B. A. Sava2, I. Albeanu3, M. Dumitrescu3, D. Ulieru4
Affiliation
- The National Institute for the Materials Physics, Bucharest-Magurele, Romania
- The National Institute for Glass, Bucharest, Romania
- The Research and Design Institute for Electrotechnics, Bucharest, Romania
- The Electronic Modules and Semiconductors-ROMES SA, Romania
Abstract
The sintering-sublimation technics was conceived for increasing the reliability of the photoconductive devices, by decreasing the concentration of mobiles donors, which are utilised for photoconductive material sensibilisation. The technics combines three different technics: the vapor phase deposition; the vacuum vaporising; the ceramic sinterisation. This special technics gives stoichiometric layers. The technics avoids dissociation (the flash sublimation technic), sublimates the compounds from two different sources, on heated support, or sublimates the compound, with Cd excess. It was investigated, by mass spectrometry and optical absorption studies, the presence, in gaseous state, of the AIIBVI molecules. The condensation on the substrate of the vapors is difficult because the Cd, Zn and Hg elements have difficulties in the condensation process. The Frenkel model, of the condensation, can be successfully used for describing the process. This model uses the observations concerning the difficulty of the condensation on supports of those elements, at higher temperatures than 90 - 195 K. It is supposed that the support surface is a potential surface, with holes and potential walls, whose dimensions can not overcome the interatomic distances, for polished surfaces..
Keywords
Sintering-sublimation, Photoconductive devices, Cadmium sulfide selenide, Mass spectrometry.
Submitted at: June 14, 2005
Accepted at: July 21, 2005
Citation
I. Nazarenco, J. Jaklovszky, V. Ghiordnescu, B. A. Sava, I. Albeanu, M. Dumitrescu, D. Ulieru, AIIBVI PHOTORESISTANCES BY SINTERING-SUBLIMATION TECHNICS, Journal of Optoelectronics and Advanced Materials Vol. 7, Iss. 4, pp. 2113-2118 (2005)
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