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DEPOSITION EXPERIMENTS OF THIN METALLIC MULTILAYERS WITH MAGNETORESISTIVE PROPERTIES

M. Avram1,*

Affiliation

  1. National Institute for Research and Development in Microtechnologies (IMT), P.O.Box 38-160, Bucharest, Romania

Abstract

The GMR properties are controlled by the materials composition, selected geometry, and the structure of interfaces of the films. A series of experiments involving RF diode sputtering deposition of GMR multilayers was presented. The process conditions used to deposit GMR multilayers have been systematically varied and the dependence of magnetotransport properties upon the process environment has been studied. Another systematic series of experiments has been conducted to evaluate the dependence of magnetotransport properties upon composition and morphology of a multilayer structure utilized for magnetic sensing..

Keywords

Magnetic multilayers, Giant magnetoresistance effect, Sputtering.

Submitted at: April 21, 2004
Accepted at: June 22, 2004

Citation

M. Avram, DEPOSITION EXPERIMENTS OF THIN METALLIC MULTILAYERS WITH MAGNETORESISTIVE PROPERTIES, Journal of Optoelectronics and Advanced Materials Vol. 6, Iss. 3, pp. 987-990 (2004)