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ELECTRICAL AND OPTICAL DIAGNOSIS OF A CAVITY HOLLOW-CATHODE POST-DISCHARGE USED AS A SPUTTERING SOURCE

P. C. Balan1, R. Apetrei1,2, D. Luca2, C. Ionita1, R. Schrittwieser1, G. Popa2,*

Affiliation

  1. Institute for Ion Physics, University of Innsbruck A-6020 Innsbruck, Austria
  2. Faculty of Physics, ”Alexandru Ioan Cuza” University, RO-700506 Ia i, Romania

Abstract

Thin films growth using plasma-assisted methods is nowadays a well-established method. The cavity hollow-cathode post-discharge has rapidly become a promising candidate as a sputtering source, due to simplicity of design and operation, good control of parameters and low cost. Additional advantages occur when using the hollow-cathode post-discharge for the sputtering of ferromagnetic materials, where standard magnetrons feature low sputtering rate. We present here experimental results on the electrical and optical diagnosis of a cavity hollow-cathode post-discharge used to deposit Ni thin films. Plasma parameters have been chosen as to cover the operation conditions in real sputtering devices..

Keywords

Hollow cathode, Langmuir probe, Electrostatic analyzer, Sputtering, Abel transform.

Submitted at: March 8, 2005
Accepted at: Sept. 22, 2005

Citation

P. C. Balan, R. Apetrei, D. Luca, C. Ionita, R. Schrittwieser, G. Popa, ELECTRICAL AND OPTICAL DIAGNOSIS OF A CAVITY HOLLOW-CATHODE POST-DISCHARGE USED AS A SPUTTERING SOURCE, Journal of Optoelectronics and Advanced Materials Vol. 7, Iss. 5, pp. 2459-2464 (2005)