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Electrical and optical properties of Cr nano-crystal/silicon ultra-thin films prepared by electrodeposition

V. GEORGESCU1,* , C. SÎRBU1, N. APETROAIEI1

Affiliation

  1. Faculty of Physics, Al. I. Cuza University, Iasi, RO-700506 Romania

Abstract

Electronic transport properties of ultra-thin films and of nanometer-sized crystallites of metals deposited onto semiconductors play an important role for the development of nanoscaled electronic devices. In this work, we report the electrical and optical properties of ultra-thin films (2 nm ÷ 150 nm) composed of Cr nano-crystals electrodeposited onto n-Si (100) phosphorous-doped single crystal. The films were prepared by an electrochemical procedure using for electrodeposition a solution based on CrO3. Three-dimensional metallic Cr nano-crystals grow over Si substrate according to a Volmer-Weber mechanism, as was evidenced by AFM measurements. The analysis of photo-resistance for a series of samples deposited for various charge densities allows us to detect the onset of metallic conductivity due to the percolation of island-like Cr metal films on the semiconductor substrate..

Keywords

Electrodeposition, Metallic films, Atomic force microscopy, Surface structure, Photoconductivity.

Submitted at: May 8, 2006
Accepted at: July 20, 2006

Citation

V. GEORGESCU, C. SÎRBU, N. APETROAIEI, Electrical and optical properties of Cr nano-crystal/silicon ultra-thin films prepared by electrodeposition, Journal of Optoelectronics and Advanced Materials Vol. 8, Iss. 4, pp. 1456-1459 (2006)