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ELECTRICAL PROPERTIES OF A THIN LAYER POLYIMIDE MATRIX

V. Strijkova1,* , D. Dimov1, A. Paskaleva2, I. Zhivkov1, E. Spassova1, J. Assa1, G. Danev1

Affiliation

  1. Central Laboratory of Photoprocesses, Bulgarian Academy of Sciences, "Acad. G. Bonchev" St., bl. 109, 1113 Sofia, Bulgaria
  2. Institute of Solid State Physics, Bulgarian Academy of Sciences, Blvd. Tzarigradsko Chaussee 72, 1784 Sofia, Bulgaria

Abstract

Polyimide thin layers (500 nm) have been prepared by vacuum co-deposition of 4, 4'- oxidianiline and pyromellitic dianhydride precursors followed by thermal treatment. The dielectric properties of the samples are evaluated by C-V and I-V measurements. It has been shown that the vacuum deposited polyimide matrix displays attractive dielectric properties: e < 3 and low leakage currents. The influence of the technological pre-history on the electrical properties of the layers has been discussed..

Keywords

Polyimide, Vacuum deposition, Electrical properties, Nanocomposites.

Submitted at: April 22, 2005
Accepted at: May 26, 2005

Citation

V. Strijkova, D. Dimov, A. Paskaleva, I. Zhivkov, E. Spassova, J. Assa, G. Danev, ELECTRICAL PROPERTIES OF A THIN LAYER POLYIMIDE MATRIX, Journal of Optoelectronics and Advanced Materials Vol. 7, Iss. 3, pp. 1319-1322 (2005)