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Electrodeposition of GaAs thin films from alkaline aqueous solution

C. GHEORGHIES1,* , L. GHEORGHIES1, G. FETECAU1

Affiliation

  1. “Dunarea de Jos” University Domneasca str., no. 47, 800008 Galati, Romania

Abstract

Gallium arsenide thin films were prepared from alkaline aqueous solution. Taking in account other conventional methods of preparing gallium arsenide films, electrodeposition technique has some advantages consisting into small operating and equipment costs, relatively easy control of film properties, and no toxic volatile raw materials. The obtained electrodeposited films from alkaline electrolyte are thick, porous and powdery. Some operation parameters namely: electrolyte composition and its pH, applied potential, current density, cathode material, temperature have an important influence on the electrodeposition process. X-ray diffraction patterns of gallium arsenide thin films show a crystalline phase after annealing process. Energy dispersive spectroscopy showed that the deposited films contain different amounts of gallium and arsenic that are in relationship with certain operating parameters..

Keywords

Gallium arsenide films, Alkaline solution, Electrocoating, Structure.

Submitted at: May 30, 2007
Accepted at: Sept. 18, 2007

Citation

C. GHEORGHIES, L. GHEORGHIES, G. FETECAU, Electrodeposition of GaAs thin films from alkaline aqueous solution, Journal of Optoelectronics and Advanced Materials Vol. 9, Iss. 9, pp. 2795-2798 (2007)