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FABRICATION AND CHARACTERIZATION OF MAGNETICALLY HARD CoPt ORDERED SUB-MICRON STRUCTURES

L. Castaldi1,* , I. Raptis2, E. Manios1, D. Niarchos1

Affiliation

  1. Institute of Materials Science, NCSR “Demokritos” Ag. Paraskevi Attiki, 153 10 Greece
  2. Institute of Microelectronics, NCSR “Demokritos” Ag. Paraskevi Attiki, 153 10 Greece

Abstract

The present study describes the properties of magnetically hard Co50Pt50 ordered sub-micron structures. The e-beam nanolithography process and the deposition by sputtering resulted in the formation of Co50Pt50 ordered arrays 250-1000 nm sized. The thermal annealing of the samples at 650 ºC for 30 minutes led to the crystallization of the specimen in the L10 phase and to their consequent magnetic hardening both in the parallel (Hc = 6.2 kOe) and in the perpendicular (Hc = 4.1 kOe) direction with respect to the film plane..

Keywords

CoPt, Hard magnetic, Sub-micron structure.

Submitted at: March 28, 2005
Accepted at: May 26, 2005

Citation

L. Castaldi, I. Raptis, E. Manios, D. Niarchos, FABRICATION AND CHARACTERIZATION OF MAGNETICALLY HARD CoPt ORDERED SUB-MICRON STRUCTURES, Journal of Optoelectronics and Advanced Materials Vol. 7, Iss. 3, pp. 1605-1609 (2005)