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General characteristics of the Thermoionic Vacuum Arc plasma

C. SURDU-BOB1,* , I. MUSTATA1, C. IACOB1

Affiliation

  1. Low Temperature Plasma Laboratory, National Institute for Lasers, Plasma and Radiation Physics, Str. Atomistilor 409, MG-36, Bucharest, Romania

Abstract

The paper presents the main characteristics of an original deposition method for the synthesis of quality thin films using anodic arc plasma, called Thermionic Vacuum Arc - TVA. This plasma was observed for the first time about 30 years ago, but only in the last three-four years research started being focused on the coating capabilities of this plasma. The work undertaken until now has demonstrated a great potential of this plasma to become a powerful thin film deposition tool for a large range of applications..

Keywords

TVA, Plasma, Deposition, Thin films.

Submitted at: June 15, 2007
Accepted at: Sept. 18, 2007

Citation

C. SURDU-BOB, I. MUSTATA, C. IACOB, General characteristics of the Thermoionic Vacuum Arc plasma, Journal of Optoelectronics and Advanced Materials Vol. 9, Iss. 9, pp. 2932-2934 (2007)