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I agree, do not show this message again.GROWTH AND CHARACTERISATION OF InGaAs(P) BY CBE TECHNIQUE
M. Udhayasankar1,* , J. Kumar2, P. Ramasamy2
Affiliation
- Physics Institute, Justus-Liebig-University, D-35392 Giessen, Germany
- Crystal Growth Centre, Anna University, Chennai (Madras) – 600 025, India
Abstract
Growth and evaluation of InGaAs(P) epilayers grown on InP by CBE technique for optical telecommunication applications is discussed. The grown InP epilayers have HALL mobility values of 70.000 and 2800 cm2/V.s with background impurities as low as 1 · 1014 cm-3 and 2 · 1015 cm-3 at 77 K and 300 K respectively. FWHM of the (004) Bragg reflection peak as narrow as 17 arcsec was obtained for these samples by HRXRD measurements. RT PL measurements also show typical spectra with a peak FWHM of about 19 nm. Lattice matched In0.53Ga0.47As was grown on InP and the strain value of 0.34 µm thick layers was about 6.7 · 10-4. The mobilities of the thick undoped ternary layer were 5970 (300 K) and 37,550 cm2/V.s (77 K) with carrier concentration in the range of 1.2 · 1015 – 4.2 · 1014 cm-3. Be-doped In0.53Ga0.47As layers with p300K = 9 · 1018 cm-3 and µ300K = 58 cm2/V.s were also grown on InP which exhibits a line width (HRXRD) of nearly 25-30 arcsec. In1-xGaxAsyP1-y quaternary epilayers (x = 0.24, y = 0.52) closely lattice matched to InP have also been grown. The HRXRD pattern of the quaternary layers shows a lattice mismatch of 2.4 · 10-3 and a luminescence peak FWHM of 8 meV. Further, the homogeneity of these layers was checked using FTPL study at different positions of the full wafer and it was extremely good. MQWs structures were also grown for the fabrication of SOA devices and are characterised by PL, absorption, ECV measurements..
Keywords
Chemical beam epitaxy, InP, InGaAs, InGaAsP, Multi quantum wells.
Submitted at: Nov. 28, 2002
Accepted at: March 12, 2003
Citation
M. Udhayasankar, J. Kumar, P. Ramasamy, GROWTH AND CHARACTERISATION OF InGaAs(P) BY CBE TECHNIQUE, Journal of Optoelectronics and Advanced Materials Vol. 5, Iss. 1, pp. 75-87 (2003)
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