"

Cookies ussage consent

Our site saves small pieces of text information (cookies) on your device in order to deliver better content and for statistical purposes. You can disable the usage of cookies by changing the settings of your browser. By browsing our site without changing the browser settings you grant us permission to store that information on your device.

I agree, do not show this message again.

IMPRINT LITHOGRAPHY ON POLY(2-HYDROXYETHYL METHACRYLATE), (PHEMA), AND EPOXYDISED NOVOLAC, (EPN) POLYMERS

F. A. Zacharatos1,2, A. Olziersky1, I. Raptis1, E. Hristoforou2,*

Affiliation

  1. NCSR “Demokritos”, Institute of Microelectronics, Agia Paraskevi, Athens 15310, Greece
  2. Laboratory of Physical Metallurgy, National Technical University of Athens, Zografu Campus, Athens 15780, Greece

Abstract

Nanoimprint lithography (NIL) is a very effective, non-conventional lithographic method, which takes advantage of the mechanical and thermal properties of polymeric materials and structures them with application of pressure and high temperature. An imprint process that presses a mold into a thin polymeric film of poly(2-hydroxyethyl methacrylate), PHEMA, and epoxydised novolac, (EPN), cast on a silicon substrate, has been developed and demonstrated. For the fulfillment of the experiments, a home-made apparatus was designed and implemented. The printed structures had a feature size of 1m and their depth didn’t exceed 50 nm in some cases..

Keywords

Nanoimprint, Poly(2-hydroxyethyl methacrylate), Epoxydised novolac, Lithography, Resist.

Submitted at: March 10, 2005
Accepted at: March 23, 2005

Citation

F. A. Zacharatos, A. Olziersky, I. Raptis, E. Hristoforou, IMPRINT LITHOGRAPHY ON POLY(2-HYDROXYETHYL METHACRYLATE), (PHEMA), AND EPOXYDISED NOVOLAC, (EPN) POLYMERS, Journal of Optoelectronics and Advanced Materials Vol. 7, Iss. 2, pp. 1121-1127 (2005)