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Influence of the quartz window in a rapid thermal processing apparatus

P.-O. LOGERAIS1,* , M. GIRTAN1,2, A. BOUTEVILLE1

Affiliation

  1. LPMI, ENSAM, Angers, France
  2. Faculty of Physics, “Al. I. Cuza” University of Iasi, Romania

Abstract

RTP (Rapid Thermal Processing) is widely used in manufacturing processes in high technology applications. In the present study, a 2D model of a RTP reactor is modified in order to investigate on the quartz window influence on the wafer temperature profile. The numerical calculations are performed in both transient and steady state, using the Monte-Carlo method for solving the radiative heat transfer equation. The absence of quartz window results in better temperature uniformity and in a shorter steady state reaching duration. The influence of the height of the wafer is also evaluated and optimised in steady state..

Keywords

RTP, Numerical simulation, Quartz window, Wafer temperature uniformity.

Submitted at: Oct. 14, 2005
Accepted at: Jan. 26, 2006

Citation

P.-O. LOGERAIS, M. GIRTAN, A. BOUTEVILLE, Influence of the quartz window in a rapid thermal processing apparatus, Journal of Optoelectronics and Advanced Materials Vol. 8, Iss. 1, pp. 139-143 (2006)