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LASER ASSISTED SURFACE MICROSTRUCTURING OF METAL/CERAMIC BILAYERED THIN FILM SYSTEMS

E. Krumov1, J. Pirov1, N. Starbov1,*

Affiliation

  1. Central Laboratory of Photoprocesses “Acad. Jordan Malinowski” –Bulgarian Academy of Sciences Acad. Georgy Bonchev str., bl.109, 1113 Sofia, Bulgaria

Abstract

A novel method for microstructuring of metal/ceramic bilayered thin film systems based on a combination of pulsed laser irradiation and electroless metal plating is developed. The ceramic thin films of ZrO2 or Al2O3 are deposited on clean glass substrate by electron beam evaporation under high vacuum conditions. Thick alumina films are also prepared on Al plates by electrochemical anodizing. Conventional thermal evaporation technique is applied for vacuum deposition of very thin Bi, Sb or Ag films (d<10 nm) on the free ZrO2 and Al2O3 surface. The samples thus prepared are irradiated via excimer (l=193 nm) or Nd:YAG (l=1064 nm) laser through suitable metal mask in order to remove the top metal film in the exposed areas. Further, the metal/ceramic bilayered systems are processed in electroless chemical bath for selective deposition of Cu or Ni on the rest metal micropattern. All processing steps are studied under SEM and by energy dispersive X-ray microanalysis (EDS). Possibilities for photochemical microstructuring of metal/ceramic bilayered thin film systems in order to obtain electroconductive Cu or electroresistive Ni microcirciuts are shown. The method developed is simple, versatile and it could be applied for rapid fabrication of circuits on any metal/ceramic system..

Keywords

Thin ceramic films, Microstructuring, Photochemical processing, Electroconductive pattern.

Submitted at: May 5, 2005
Accepted at: May 26, 2005

Citation

E. Krumov, J. Pirov, N. Starbov, LASER ASSISTED SURFACE MICROSTRUCTURING OF METAL/CERAMIC BILAYERED THIN FILM SYSTEMS, Journal of Optoelectronics and Advanced Materials Vol. 7, Iss. 3, pp. 1359-1364 (2005)