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MAGNETIC AND ELECTRICAL PROPERTIES OF [NiFe/SiO2]x N MULTILAYER THIN FILMS

M. Urse1,* , A- E. Moga1, M. Grigoras1, H. Chiriac1

Affiliation

  1. National Institute of R & D for Technical Physics, 47 Mangeron Blvd., Iasi, Romania

Abstract

The ferromagnetic material/SiO2 multilayer films exhibit very good soft magnetic properties attributed to nanocrystalline metallic phases. Concurrently, high resistivity of ferromagnetic material/SiO2 multilayer thin films receives much attention from the standpoint of low core loss for high frequency use. Permalloy NiFe is an important material widely used in magnetic industry because of its permeability and low anisotropy. This paper reports some results concerning the effects of the composition and thermal treatment conditions on the structural, electrical and magnetic properties of [FeNi/SiO2]×N thin films. The [FeNi(6nm)/(SiO2)(2nm)]×30 films exhibit high resistivity over 10-2 mΩ-m, while superior soft magnetic properties, specific for FeNi thin films are maintained. The [FeNi/(SiO2)]×30 annealed films show good magnetic properties of saturation magnetization ≅ 1670×10-7 Tm3/kg and coercivity ≅ 1520 A/m. This class of magnetic materials may be interesting for thin - film inductors which can operating at high frequencies..

Keywords

Multilayer thin films, Soft magnetic properties, Nanocrystalline structure, High frequencies.

Submitted at: Aug. 8, 2004
Accepted at: March 23, 2005

Citation

M. Urse, A- E. Moga, M. Grigoras, H. Chiriac, MAGNETIC AND ELECTRICAL PROPERTIES OF [NiFe/SiO2]x N MULTILAYER THIN FILMS, Journal of Optoelectronics and Advanced Materials Vol. 7, Iss. 2, pp. 759-762 (2005)