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NUMERICAL SIMULATION APPLIED TO CHEMICAL VAPOUR DEPOSITION PROCESS. RAPID THERMAL CVD AND SPRAY CVD

A. Bouteville1,*

Affiliation

  1. ENSAM LPMI – 2 Bd du Ronceray BP 35, 49035 Angers, France

Abstract

The paper gives an overview of the different applications of the numerical simulation in chemical vapour deposition (CVD) process and equipment. In particular, emphasis will be given to the modelling of Rapid Thermal Low Pressure CVD and to the perspective of modelling Spray CVD..

Keywords

Chemical Vapour Deposition, Numerical simulation, Rapid Thermal Process, Spray CVD.

Submitted at: Aug. 18, 2004
Accepted at: March 23, 2005

Citation

A. Bouteville, NUMERICAL SIMULATION APPLIED TO CHEMICAL VAPOUR DEPOSITION PROCESS. RAPID THERMAL CVD AND SPRAY CVD, Journal of Optoelectronics and Advanced Materials Vol. 7, Iss. 2, pp. 599-606 (2005)