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ON FABRICATION OF LARGE FORMAT OPTOELECTRONIC ELEMENTS

P. Sharlandjiev1,* , B. Markova1

Affiliation

  1. Central Laboratory of Optical Storage and Processing of Information, Bulgarian Academy of Sciences, “Acad. G. Bonchev” Str., Bl. 109, BG-1113 Sofia, Bulgaria

Abstract

We discuss different methods for synthesis and analysis of large format optical elements with predetermined reflectance or/and transmittance characteristics. Chemical vapor deposition, electron beam evaporation and ion beam sputter deposition are well-established techniques for production of optical coatings and multilayers. There are some intrinsic limitations for the quality of such elements, i.e. position of source, target and substrate. Holographic techniques are an alternative to “classical” optical elements fabrication. We compare different methods for analysis of the optical response of large “classical” and holographic elements (Abélès characteristic matrix and Lorenz – Mie theory) as well as some possible applications, related to solar concentrators and holographic Fabry – Perrot elements..

Keywords

Holography, Holographic optical elements, Photosensitive materials.

Submitted at: Jan. 13, 2003
Accepted at: March 12, 2003

Citation

P. Sharlandjiev, B. Markova, ON FABRICATION OF LARGE FORMAT OPTOELECTRONIC ELEMENTS, Journal of Optoelectronics and Advanced Materials Vol. 5, Iss. 1, pp. 39-43 (2003)