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OPTICAL AND SURFACE PROPERTIES TiO2 THIN FILMS DEPOSITED BY DC MAGNETRON SPUTTERING METHOD

M. Stamate1,* , I. Vascan1, I. Lazar1, G. Lazar1, I. Caraman1, M. Caraman1

Affiliation

  1. Bacau University, Calea Marasesti nr.157, Bacau, 5500, Romania

Abstract

TiO2 thin films were deposited through a d. c. magnetron sputtering method. An analysis of the optical properties of TiO2 thin films deposited on glass is presented. A strong dependence between the values of TiO2 optical band gap and argon/oxygen ratios has been revealed. Changes in optical, properties of TiO2 thin films, with thermal annealing parameters and gas flowing rate were observed. The optical band gap varies from 3 eV > 3.4 eV as a function of oxygen/argon ratios in the flowing gas between 10% to 50%. The surface conductivity was found to depend on the pressure, in the deposition space..

Keywords

TiO2, DC magnetron sputtering method, Optical gap.

Submitted at: June 9, 2004
Accepted at: March 23, 2005

Citation

M. Stamate, I. Vascan, I. Lazar, G. Lazar, I. Caraman, M. Caraman, OPTICAL AND SURFACE PROPERTIES TiO2 THIN FILMS DEPOSITED BY DC MAGNETRON SPUTTERING METHOD, Journal of Optoelectronics and Advanced Materials Vol. 7, Iss. 2, pp. 771-774 (2005)