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PHOTOINDUCED BACTERICIDAL ACTIVITY OF TiO2 THIN FILMS OBTAINED BY RADIOFREQUENCY MAGNETRON SPUTTERING DEPOSITION

C. Miron1, A. Roca1, S. Hoisie2, P. Cozorici2, L. Sirghi1,*

Affiliation

  1. Faculty of Physics, “Al. I. Cuza” University, 11 Blvd. Carol I, 700507 Iasi, Romania
  2. “Dr. I. Cantacuzino” Institute, Iasi, Romania

Abstract

This paper reports results of an atomic force microscopy (AFM) investigation of cell damage and death of bacteria deposited on titanium dioxide (TiO2) thin films irradiated by the UV light. The bactericidal activity against Diplococcus pneumoniae, Staphylococcus aureus and Escheridria Coli was investigated for the TiO2 films deposited on silicon Si (100) wafers by radio frequency magnetron sputtering of a pure ceramic TiO2 target in Ar-O2 mixture gas at 10 mTorr. These films were reported to be amorphous with a short range anatase like atom ordering and to have a good photocatalytic activity (good UV light induced hydrophilicity). The AFM measurements revealed that one hour after UV irradiation most of the bacteria on the UV irradiated surface of TiO2 thin films presented membrane destruction, which led to death of the cells. AFM measurements made 6 hours after the UV irradiation showed that all the cells on the TiO2 surface were killed..

Keywords

Titanium dioxide, Bactericidal activity, Atomic force microscopy.

Submitted at: June 18, 2004
Accepted at: March 23, 2005

Citation

C. Miron, A. Roca, S. Hoisie, P. Cozorici, L. Sirghi, PHOTOINDUCED BACTERICIDAL ACTIVITY OF TiO2 THIN FILMS OBTAINED BY RADIOFREQUENCY MAGNETRON SPUTTERING DEPOSITION, Journal of Optoelectronics and Advanced Materials Vol. 7, Iss. 2, pp. 915-919 (2005)