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PULSED LASER DEPOSITION OF NiFe2O4 THIN FILMS

O. F. Caltun1,*

Affiliation

  1. ”Alexandru Ioan Cuza" University, Faculty of Physics, 11 Blvd. Carol I, Iasi, 6600, Romania

Abstract

Thin NiFe2O4 ferrite amorphous and crystalline films were grown on different substrates. The energy of the laser beam, the O2 pressure, the substrate temperature, and the distance between the target and the substrate were varied in order to establish the optimal deposition conditions for the thin films. The microstructure of the thin films was characterized by XRD, SEM, EDX and AFM analysis. The characteristics of the investigated specimens were interpreted in terms of the role of the post annealing condition on the microstructure, on stoichiometry and on the magnetic properties of the NiFe2O4 thin films..

Keywords

Pulsed laser deposition, NiFe2O4 thin film, Post annealing, Magnetic properties.

Submitted at: April 20, 2004
Accepted at: June 22, 2004

Citation

O. F. Caltun, PULSED LASER DEPOSITION OF NiFe2O4 THIN FILMS, Journal of Optoelectronics and Advanced Materials Vol. 6, Iss. 3, pp. 935-938 (2004)