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STUDY ON TERMIONIC VACUUM ARC- A NOVEL AND ADVANCED TECHNOLOGY FOR SURFACE COATING

S. Pat1, N. Ekem1, T. Akan1, Ö. Küsmüs1, S. Demirkol1, R. Vladoiu2, C. P. Lungu3, G. Musa3,*

Affiliation

  1. Osmangazi University, Faculty of Art&Science, Physics Department, 26480, Eskisehir, Turkey
  2. Department of Physics, Ovidius University, Constanta, Romania
  3. National Institutes for Lasers, Plasma and Radiation Physics, Magurele, Romania

Abstract

The Thermionic Vacuum Arc (TVA) discharge is an original technology for thin film deposition in high vacuum conditions. The originality of this method consists in the fact that the substrate is bombarded with energetic ions (of 200-500 eV) of the material to be deposited just during deposition and no buffer gas is needed. The TVA plasma is ignited in the vapors of the anode material by heated cathode electron bombardment. The electron temperature of the Thermionic Vacuum Arc in silver vapor plasma was determined by using the optical emission spectroscopy (OES) obtained for different arc parameters..

Keywords

TVA, Metal vapor plasma temperatures, Silver metal vapor plasmas, Optical Emission Spectroscopy (OES) of silver plasma.

Submitted at: April 11, 2005
Accepted at: Sept. 22, 2005

Citation

S. Pat, N. Ekem, T. Akan, Ö. Küsmüs, S. Demirkol, R. Vladoiu, C. P. Lungu, G. Musa, STUDY ON TERMIONIC VACUUM ARC- A NOVEL AND ADVANCED TECHNOLOGY FOR SURFACE COATING, Journal of Optoelectronics and Advanced Materials Vol. 7, Iss. 5, pp. 2495-2499 (2005)