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Substrate thermal profiles in spray-CVD reactor

M. GIRTAN1,2, P.-O. LOGERAIS1,* , A. BOUTEVILLE1

Affiliation

  1. LPMI, ENSAM, Angers, France
  2. Faculty of Physics, “Al. I. Cuza” University of Iasi, Romania

Abstract

The spray CVD technique is an interesting method for depositing coatings such as Transparent Conducting Oxides. The substrate temperature is the major factor, which determines the thickness uniformity of the deposited films. This paper summarizes recent simulation results of heat transfer in a reactor of Spray-CVD using an infrared (IR) lamp furnace. In order to establish the optimal deposition conditions, the substrate thermal profile is analyzed for different IR lamp temperatures..

Keywords

Spray CVD, Numerical simulation, Substrate temperature uniformity.

Submitted at: Oct. 14, 2005
Accepted at: Jan. 26, 2006

Citation

M. GIRTAN, P.-O. LOGERAIS, A. BOUTEVILLE, Substrate thermal profiles in spray-CVD reactor, Journal of Optoelectronics and Advanced Materials Vol. 8, Iss. 1, pp. 144-147 (2006)