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SURFACE CHEMISTRY OF PLASMA DEPOSITED ZrC HARD COATINGS

M. Balaceanu1,* , M. Braic1, V. Braic1, A. Vladescu1, C. C. Negrila2

Affiliation

  1. National Institute for Optoelectronics, P.O.Box. MG-5, R 077125, Bucharest, Romania
  2. National Institute for Materials Physics, P.O.BoxMG-7, Bucharest, Romania

Abstract

X-ray Photoelectron Spectroscopy (XPS) was used to investigate the chemical state of ZrC coatings deposited by cathodic arc method. A chemistry model of the ZrC films has been proposed. It was pointed out that on the films surface a highly oxidized passive layer, containing also carbon and oxygen as contaminants, was formed. The film bulk was composed by a mixture of ZrC (the dominant phase), ZrO2 and free carbon..

Keywords

ZrC coatings, Cathodic arc deposition, Chemical composition, XPS.

Submitted at: Jan. 13, 2005
Accepted at: Sept. 22, 2005

Citation

M. Balaceanu, M. Braic, V. Braic, A. Vladescu, C. C. Negrila, SURFACE CHEMISTRY OF PLASMA DEPOSITED ZrC HARD COATINGS, Journal of Optoelectronics and Advanced Materials Vol. 7, Iss. 5, pp. 2557-2560 (2005)