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Surface modification of PVDF by plasma treatment for electroless metallization

M. PASCU1,* , D. NICOLAS2, F. PONCIN-EPAILLARD2, C. VASILE3

Affiliation

  1. ”Gr. T. Popa” Medicine and Pharmacy University, 16 University Str., 700115 Iasi, Romania
  2. Université du Maine, av. O. Messiaen, 72000 Le Mans, France
  3. “P. Poni” Institute, 41A Gr. Ghica Voda alley, 700487 Iasi, Romania

Abstract

Surface properties of polyvinylidene fluoride (PVDF) films have been modified in a controlled manner, by treatment in a radio frequency nitrogen plasma, and a microwave one, at different treatment powers. It was proved that both plasma treatments significantly improved the adherence and the quality of the deposited metal layer. The RF plasma treatment seems to be less efficient in respect with the microwave plasma one, for small powers, but the obtained results are similar at discharge powers higher than 50 W..

Keywords

Polyvinylidene fluoride, Plasma treatment, Metallization.

Submitted at: March 15, 2006
Accepted at: May 18, 2006

Citation

M. PASCU, D. NICOLAS, F. PONCIN-EPAILLARD, C. VASILE, Surface modification of PVDF by plasma treatment for electroless metallization, Journal of Optoelectronics and Advanced Materials Vol. 8, Iss. 3, pp. 1062-1064 (2006)