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THE ANALYSIS OF THE INTERACTION METAL-SUPPORT IN Ni CATALYSTS BY EXTENDED X-RAY ABSORPTION FINE STRUCTURE AND X-RAY DIFFRACTION USING SYNCHROTRON RADIATION

N. Aldea1,* , B. Barz1, A. C. Gluhoi1, P. Marginean1, X. Yaning2, H. Tiandou2, L. Tao2, Z. Wu2,2

Affiliation

  1. National Institute for Research and Development of Isotopic and Molecular Technologies, 71-103 Donath, P.O. Box 700, 400293 Cluj-Napoca 5, Romania
  2. Beijing Synchrotron Radiation Facilities of Beijing Electron Positron Colider National Laboratory, Beijing, People's Republic of China

Abstract

The supported Ni catalysts were analyzed by extended X-ray absorption fine structure and X-ray diffraction, in order to determine their local and global structure. The present study has pointed out a strong deformation of the local structure of the metal, due to its interaction with oxide support. The average particle size, the mean squares of the microstrain, the probability of the faults, the particle size distribution and microstrain functions of the supported Ni catalysts were determined by X-ray diffraction method. The method is based on Fourier analysis of the experimental X-ray line profiles (111), (200) and (220). The global structure is obtained with a fitting method based on generalized Fermi function facilities for approximation. The local and global microstructures of the catalysts are modified by the strong interaction between the metal clusters and oxide supports. As a result the chemisorption and catalytic processes which occur at the Ni-support interface are also changed..

Keywords

Supported metal catalysts, X-ray diffraction, X-ray absorption near edge structure, Extended X-ray absorption fine structure, Catalytic activity.

Submitted at: July 14, 2004
Accepted at: Dec. 6, 2004

Citation

N. Aldea, B. Barz, A. C. Gluhoi, P. Marginean, X. Yaning, H. Tiandou, L. Tao, Z. Wu, THE ANALYSIS OF THE INTERACTION METAL-SUPPORT IN Ni CATALYSTS BY EXTENDED X-RAY ABSORPTION FINE STRUCTURE AND X-RAY DIFFRACTION USING SYNCHROTRON RADIATION, Journal of Optoelectronics and Advanced Materials Vol. 6, Iss. 4, pp. 1287-1296 (2004)