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THERMALLY INDUCED STRUCTURAL TRANSFORMATIONS IN CVD TRANSITION METAL OXIDE THIN FILMS

K. Gesheva1,* , A. Cziraki2, T. Ivanova1, A. Szekeres3

Affiliation

  1. Central Laboratory of Solar Energy and New Energy Sources of the Bulgarian Academy of Sciences, Blvd."Tzarigradsko Chaussee" 72, 1784 Sofia, Bulgaria
  2. Eotvos Lorand University, Faculty of Solid State Physics, Pazmany Peter setany 1, 1117 Budapest, Hungary
  3. Institute of Solid State Physics of the Bulgarian Academy of Sciences, Blvd."Tzarigradsko Chaussee" 72, 1784 Sofia, Bulgaria

Abstract

Thin films of molybdenum, tungsten and mixed MoO3-WO3 oxides, obtained by atmospheric pressure chemical vapor deposition, were investigated by Raman and XRD measurements. All of the films were prepared using identical technological parameters, and were annealed at 400 oC. Analysis of the Raman and XRD spectra for the three types of film shows that molybdenum oxide films crystallized as orthorhombic MoO3, with a small fraction of MoO2.89 sub-oxide, while the annealed tungsten oxide films were triclinic WO3 with less than 2 % of the sub-oxide of W20O58. The Raman spectra of the mixed MoO3-WO3 films indicated the crystalline phases of molybdenum and tungsten oxides in an amorphous network. In addition, the XRD results showed that the structure of the mixed oxides followed the crystallization of WO3, and Mo atoms were suggested to substitute for W in the WO3 lattice..

Keywords

CVD thin films, Electrochromic metal oxides, Vibrational properties, XRD analysis.

Submitted at: Dec. 9, 2004
Accepted at: Jan. 26, 2005

Citation

K. Gesheva, A. Cziraki, T. Ivanova, A. Szekeres, THERMALLY INDUCED STRUCTURAL TRANSFORMATIONS IN CVD TRANSITION METAL OXIDE THIN FILMS, Journal of Optoelectronics and Advanced Materials Vol. 7, Iss. 1, pp. 557-560 (2005)