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THERMIONIC VACUUM ARC (TVA) - CARBON THIN FILM DEPOSITION

G. Musa1,* , I. Mustata2, V. Ciupina3, R. Vladoiu3, G. Prodan3, C. P. Lungu2, H. Ehrich4

Affiliation

  1. National Institute for Physics of Laser, Plasma and Radiation, Bucharest-Magurele, Romania
  2. National Institute for Physics of Laser, Plasma and Radiation, Bucharest-Magurele, Romania
  3. Department of Physics, “ Ovidius University “, Constanta, Romania
  4. Department of Physics, University of Essen, Essen, Germany

Abstract

Amorphous carbon (a-C) films were prepared using the novel thermionic vacuum arc (TVA) method. The prepared films, 30 nm in thickness, sp3 rich (up to 90%) were identified as diamond like (DLC) nanostructures. The nanohardness of the films is of the order of 50 – 60 GPa, and the coeffcient of friction of 0.05 – 0.1. HRTEM (High Resolution Transmission Electron Microscop), SAED (Selected Area Electron Diffraction), XPS (X-ray photoelectron spectroscopy) and Raman spectroscopy were used for the characterization of the deposited films..

Keywords

Thermionic Vacuum Arc, Carbon thin film deposition, HRTEM.

Submitted at: May 6, 2005
Accepted at: Sept. 22, 2005

Citation

G. Musa, I. Mustata, V. Ciupina, R. Vladoiu, G. Prodan, C. P. Lungu, H. Ehrich, THERMIONIC VACUUM ARC (TVA) - CARBON THIN FILM DEPOSITION, Journal of Optoelectronics and Advanced Materials Vol. 7, Iss. 5, pp. 2485-2487 (2005)