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THERMOIONIC VACUUM ARC – A NEW METHOD OF THIN FILM DEPOSITION

R. Vladoiu1, G. Musa1,2, I. Mustata2,*

Affiliation

  1. Department of Physics, Ovidius University Constanta, 8700, Romania
  2. National Institute for Laser, Plasma and Radiation Physics, Bucharest/Magurele, Romania

Abstract

New equipment for the technology of thin film deposition using thermoionic vacuum arc is presented. Advantages of this system are underlined: extended application possibilities for the increase of the microhardness of the pieces, decrease of the friction of moving pieces, change of the chemical reactivity of the pieces (corrosion resistant components). The new technique can be used for the development of nanostructural materials..

Keywords

Thin film, Thermoionic vacuum arc method.

Submitted at: Nov. 22, 2002
Accepted at: March 12, 2003

Citation

R. Vladoiu, G. Musa, I. Mustata, THERMOIONIC VACUUM ARC – A NEW METHOD OF THIN FILM DEPOSITION, Journal of Optoelectronics and Advanced Materials Vol. 5, Iss. 1, pp. 325-330 (2003)