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Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization

R. VLADOIU1,* , V. CIUPINA1, C. P. LUNGU2, V. BURSIKOVA3, G. MUSA1,2

Affiliation

  1. Ovidius University, B-dul Mamaia 125 Constanta, 900527, Romania.
  2. National Institute for Laser Plasma and Radiation Physics, Bucharest, Romania
  3. Department of Physical Electronics, Faculty of Science, Masaryk University, 611 37 Brno, Czech Republic

Abstract

In this paper, we present the characterization of the tungsten thin films deposited by Thermo-ionic Vacuum Arc (TVA) method. Characterization of the obtained tungsten thin films has been made by Transmission Electron Microscope (TEM) with a magnification of 1.4 M and a resolution of 1.4 Å. Other techniques were used as Grain Size Distribution, Selected Area Diffraction (SAED), Fast Fourier Transmission (FFT). The obtained films were characterized by nano-indentation and atomic force microscopy (AFM). The AFM measurements have proved the smoothness of the deposited films (however with some droplets) with peak to valley roughness in the range of 20-30 nm. As regards tribological results, the hardness of deposited films was measured by a Karl Zeiss microhardner tester and the coefficient of friction was measured with an Amsler tribometer. The samples (graphite substrates 30 mm x 30 mm x 8 mm coated with W) were tested using depth sensing indentation tester Fischerscope H100 Xyp. We can report that the tungsten film had significantly higher resistance against indentation..

Keywords

Tungsten thin films, Thermo-ionic vacuum arc, AFM, HRTEM, Nano-intendation.

Submitted at: Oct. 14, 2005
Accepted at: Jan. 26, 2006

Citation

R. VLADOIU, V. CIUPINA, C. P. LUNGU, V. BURSIKOVA, G. MUSA, Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization, Journal of Optoelectronics and Advanced Materials Vol. 8, Iss. 1, pp. 71-73 (2006)