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THIN ZnO FILMS PRODUCED BY PULSED LASER DEPOSITION

A. Og. Dikovska1,* , P. A. Atanasov1, C. Vasilev2, I. G. Dimitrov3, T. R. Stoyanchov3

Affiliation

  1. Institute of Electronics, Bulgarian Academy of Science 72 Tsarigradsko Chaussee, 1784 Sofia, Bulgaria
  2. Department of Physics and Astronomy, University of Sheffield Hicks Building, Hounsflied Rd., Sheffield S3 7RH, United Kingdom
  3. Institute of Electronics, Bulgarian Academy of Science 72 Tsarigradsko Chaussee, 1784 Sofia, Bulgaria

Abstract

In this work, thin ZnO films have been produced by pulsed laser deposition on (001) SiO2 substrates. The influence of the substrate temperature and oxygen pressure applied on the structural, morphological, and optical properties of the films were investigated. All ZnO films are textured along (002) direction. The increase of the substrate temperature enhances the diffraction peak intensity for all oxygen pressures applied. Highest intensity peak for a fixed temperature was obtained at pressure in the range 0.05 – 0.1 mbar. The increase of the substrate temperature at 0.1 mbar leads to deposition of smoother films with an average RMS value of 9 – 11 nm. The film morphology changes with the increase of oxygen pressure at fixed temperature. Highest optical transmission was achieved at room temperature. The increase of the oxygen pressure reduces the film transmission in the visible range of the spectra. The value of the measured waveguide losses strongly depends on the crystalline quality and surface roughness of the films. The optical losses decrease to a value lower than 3 dB/cm when temperature increases..

Keywords

ZnO thin films, Pulsed laser deposition, Optical gas sensors.

Submitted at: April 12, 2005
Accepted at: May 26, 2005

Citation

A. Og. Dikovska, P. A. Atanasov, C. Vasilev, I. G. Dimitrov, T. R. Stoyanchov, THIN ZnO FILMS PRODUCED BY PULSED LASER DEPOSITION, Journal of Optoelectronics and Advanced Materials Vol. 7, Iss. 3, pp. 1329-1334 (2005)