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R. SUBBA REDDY1,* , S. UTHANNA1, T. SRIKANTH2, A. SIVASANKAR REDDY2, B. RADHA KRISHNA3
- Department of Physics, Sri Venkateswara University, Tirupati- 517 502, India
- Department of Physics, Vikrama Simhapuri Univerisity PG Center, Kavli -524 021, India
- Department of Physics, NBKR Institute of Science and Technology, Vidyanagar-524413, India
In this paper ZnO thin films were prepared by radio frequency reactive magnetron sputtering on p-type silicon (100) and glass substrates by varying the different substrate temperatures and different oxygen partial pressure and study the structural, compositional, microstructrue, morphological and optical properties by X-ray diffraction, scanning electron microscopy, atomic microscopy and UV-Vis-NIR spectrophotometer. The X- Ray diffraction results confirmed that the films consists of ZnO peaks of (100), (002) and (110). The Fourier transform infrared spectrum confirms the presence of Zn-O bonding at wave number of 413 cm-1. The SEM analysis confirms that the films formed at oxygen partial pressure of 8x10-3 Pa, the nanowires were formed parallel to the surface layer and the nanotubes were formed perpendicular to the surface of the film. The optical transmittance data reveals the average transmittance in the visible range more than 84 % for all the films. The optical band gap of ZnO films increased from 3.04 to 3.14 eV with increase of oxygen partial pressures..
Zinc oxide, Sputtering, Nanostructure, Nanowires, Optical properties.
Submitted at: July 13, 2019
Accepted at: Feb. 12, 2019
R. SUBBA REDDY, S. UTHANNA, T. SRIKANTH, A. SIVASANKAR REDDY, B. RADHA KRISHNA, The effect of oxygen partial pressure and substrate temperature on the structural and optical properties of ZnOnanowires, Journal of Optoelectronics and Advanced Materials Vol. 21, Iss. 1-2, pp. 136-144 (2019)
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