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Advanced materials and technologies for high-pressure krypton detectors in industrial use

M. R. CALIN1, M. A. CALIN2,* , S. VLASE3, I. RADULESCU1, C. A. SIMION1

Affiliation

  1. “Horia Hulubei” National Institute for Physics and Nuclear Engineering - IFIN HH, P.O. Box MG-6, 077125, Magurele,Romania
  2. Nationale Institute of Research and Development for Optoelectronics – INOE 2000, P.O. Box MG-5, 077125, Magurele, Romania
  3. Transilvania University of Brasov, Department of Mechanics, 29 Eroilor Blvd, 500036 Brasov, Romania

Abstract

A new approach to design of high-pressure Kripton (HPKr) cylindrical ionization chambers is investigated. The measurement of the thickness of sheets made of different materials, e. g. metal, plastic, paper, cellulose, rubber, etc., is one of many industrial applications of nuclear techniques. The ionizing radiation detectors of ionization chamber type are based on measuring the variations in either exposure rate (for gamma radiation) or absorbed dose rate (for beta radiation) occurring in materials of different thickness, placed between the radiation source and the detector. The variations in exposure rate and absorbed dose rate can be traced by using radiation detectors of the ionization chamber type, which convert the exposure rate X & , or the absorbed dose rate, D& , into a proportional electric current. The more stable the ionization current of the chambers (keeping a constant exposure rate or absorbed dose rate), the slighter the variations that can be detected in either exposure rate or absorbed dose rate, hence in the absorbing material placed between the radiation source and the detector. Based on these facts, several variants of such detectors, including the ionization chambers: CISP5M, CISP2M and CISP8M, have been done..

Keywords

Under pressure detectors, radiation detectors, Krypton, ionization chamber.

Submitted at: Aug. 1, 2011
Accepted at: Sept. 15, 2011

Citation

M. R. CALIN, M. A. CALIN, S. VLASE, I. RADULESCU, C. A. SIMION, Advanced materials and technologies for high-pressure krypton detectors in industrial use, Journal of Optoelectronics and Advanced Materials Vol. 13, Iss. 9, pp. 1181-1184 (2011)