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Application of ultrashort lasers pulses in micro- and nano-technologies

M. ZAMFIRESCU1,* , M. ULMEANU1, F. JIPA1, R. CATALINA1, I. ANGHEL1, R. DABU1

Affiliation

  1. National Institute for Laser, Plasma and Radiation Physics INFLPR-Bucharest, Atomistilor 409, 077125 Magurele, Romania

Abstract

Laser induced modification of materials is used for produce micro and nanostructures. Different techniques such as laser ablation, two-photon photopolymerization (TPP), near-field laser lithography (NFLL) are developed for structuring of various shapes and geometries using laser beams with 180 fs pulse duration at 775 nm, or 400 ps pulse duration at 532 nm. The realized structures and their applications are presented..

Keywords

Ultrashort laser pulses, Laser micro-structuring, Laser direct-writing, Two -photon photopolymerization, Near-field laser lithography.

Submitted at: Sept. 10, 2010
Accepted at: Nov. 19, 2010

Citation

M. ZAMFIRESCU, M. ULMEANU, F. JIPA, R. CATALINA, I. ANGHEL, R. DABU, Application of ultrashort lasers pulses in micro- and nano-technologies, Journal of Optoelectronics and Advanced Materials Vol. 12, Iss. 11, pp. 2179-2184 (2010)