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Carbon-metal thin films deposited by thermionic vacuum arc method (TVA)

D. MANOLE1,* , C. CASAPU1, O. POMPILIAN2, C. P. LUNGU2, G. PRODAN1, V. CIUPINA1

Affiliation

  1. Department of Physics, Ovidius University, Constanta, 900527, Romania
  2. National Institute for Laser, Plasma and Radiation Physics, 077125, Romania

Abstract

The aim of this paper is to present and characterise some carbon-metal films (such as C-Cu and C-Sn) obtained by the TVA method. Carbon-metal deposition is interesting for the following reasons: a fundamental investigation meants to study how carbon and metal behave when they are alloyed; the ability of manipulating the tribological properties by infiltrating metal inclusions and metal carbides inside the films of amorphous carbon as well as the ability of lowering the stress and improving the adhesion of the prepared films. By transmission electron microscopy (TEM) analysis performed with a Philips CM 120 microscope with 2Å resolution, the structure of the carbon-metal films was identified as nansosized metalic grains (5-10 nm in diameter) embedded in the carbon matrix. The tribological properties were analyzed by a CSM-Switzerland, ball-on-disc tribometer using 6mm diameter saphire balls, 1N load at 0.1 m/s sliding speed in dry conditions. The coefficients of friction of the prepared carbon-metal films were found to be lowered by factors between 3 and 5 compared to those of the uncoated substrates..

Keywords

Carbon-metal films, C-Cu, C-Sn, Thermionic vacuum arc method, TEM.

Submitted at: Sept. 1, 2008
Accepted at: Nov. 11, 2008

Citation

D. MANOLE, C. CASAPU, O. POMPILIAN, C. P. LUNGU, G. PRODAN, V. CIUPINA, Carbon-metal thin films deposited by thermionic vacuum arc method (TVA), Journal of Optoelectronics and Advanced Materials Vol. 10, Iss. 11, pp. 2954-2957 (2008)