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Deposition and diffusion of plasma sputtered platinum nanoparticles in porous anodic aluminum oxide.

SUJUAN WU1,2, PASCAL BRAULT2,* , CONG WANG1

Affiliation

  1. Center for Condensed Matter and Material Physics, Beihang University, Beijing,100191, China
  2. GREMI UMR 6606 CNRS-Université d’Orléans, 14, rue d’Issoudun BP 6744, F-45067 ORLEANS Cedex 2, France

Abstract

Plasma sputtering deposition of Platinum thin films is studied on porous anodic aluminum oxide (AAO) template. The size effect of AAO cylindrical pores is shown to influence the diffusion of atoms in the porous layer. The resulting maximum reached depth of platinum varied from 2 μm to 20 μm, and the density on the surface is lowered from 23 µg.cm-2 to 5 µg.cm-2 as the pore diameter increased from 40 nm to 320 nm. The pore diameter is decreasing as Pt is deposited. Sputtered Pt is observed to grow as clusters on the surface and along the pore walls..

Keywords

Anodic aluminum oxide, Sputtering deposition, Platinum, Anomalous diffusion, RBS.

Submitted at: June 17, 2009
Accepted at: Feb. 27, 2010

Citation

SUJUAN WU, PASCAL BRAULT, CONG WANG, Deposition and diffusion of plasma sputtered platinum nanoparticles in porous anodic aluminum oxide., Journal of Optoelectronics and Advanced Materials Vol. 12, Iss. 3, pp. 451-455 (2010)