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Digital division mask technique for improving the lithography quality of DMD based system

ZHIMIN ZHANG1,2, YIQING GAO2, NINGNING LUO1,2,* , MIN CHEN2

Affiliation

  1. College of Automation Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China
  2. Key Laboratory of Nondestructive Test (Chinese Ministry of Education), Nanchang HangKong University, Nanchang 330063, China

Abstract

To decrease the high frequency energy loss resulted from the low pass property of reduction lens in DMD based maskless li thography system, the digital division mask technique has been proposed . Three digital division methods have been developed to fabricate different types of microstructures, including periodic amplification division, bit coding division and the two combine. For verification of the proposed methods, simulations and experiments have been performed to fabricate binary grating, zigzag grating and other microstructures. Comparative exposure patterns reveal that these met hods are versatile and reliable for improvi ng the lithography quality of DMD based system.

Keywords

Digital division mask, Periodic amplification division, Bit coding division, Lithography quality.

Submitted at: March 12, 2013
Accepted at: July 10, 2014

Citation

ZHIMIN ZHANG, YIQING GAO, NINGNING LUO, MIN CHEN, Digital division mask technique for improving the lithography quality of DMD based system, Journal of Optoelectronics and Advanced Materials Vol. 16, Iss. 7-8, pp. 909-918 (2014)