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Effect of Al-incorporation of nanocrystalline zinc oxide thin film prepared by chemical spray Pyrolysis method

GIRJESH SINGH1,* , S.B.SHRIVASTAVA1, V. GANESAN2

Affiliation

  1. School of Studies in Physics, Vikram University, Ujjain (M.P.) India- 456010
  2. UGC-DAE-Consortium for Scientific Research, Khandwa Road, Indore (M.P) India-452017

Abstract

A rapid screening methodology for the development of transparent conducting oxides is presented. The effect of Al concentration on ZnO films has been studied. All films were fabricated by a homemade chemical spray pyrolysis system (CSPT). The methodology, based on a combination of X-ray Spectrograph, Atomic Force Micrographs, UV-Visible Spectrographs and four-point probe measurements, was used to map out the structural and Opto-electronic properties over a Spray Deposited ZnO:Al film. These films are found to show high crystallinity up to (1%) Al concentration and an increase of Al concentration cause a decrease in quality of films confirmed by X-ray diffraction technique leads to introduction of defects in ZnO. The minimum resistivity and maximum transparency is obtained for the sample with nominal Al concentration of 1%. The grain sizes are found to decrease with the high Al concentration confirmed by AFM images..

Keywords

: ZnO, ZnO:Al, Chemical Spray Pyrolysis, Thin films.

Submitted at: April 25, 2013
Accepted at: Sept. 18, 2013

Citation

GIRJESH SINGH, S.B.SHRIVASTAVA, V. GANESAN, Effect of Al-incorporation of nanocrystalline zinc oxide thin film prepared by chemical spray Pyrolysis method, Journal of Optoelectronics and Advanced Materials Vol. 15, Iss. 9-10, pp. 1052-1058 (2013)