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Effect of annealing temperature on structural and optical properties of ZnO thin films deposited by spin coating method for optoelectronic devices applications

S. NITHYA1, R. SENGODAN1,*

Affiliation

  1. Department of Physics, Kumaraguru College of Technology, Coimbatore-49, India

Abstract

Zinc oxide thin films were deposited on thoroughly cleaned glass substrates using the spin coating technique and subsequently characterized by X-ray diffraction (XRD) and UV–Vis spectroscopy. The XRD patterns confirmed the formation of a hexagonal wurtzite crystal structure, with crystallite size found to increase progressively with annealing temperature, reflecting improved crystallinity. Structural parameters such as dislocation density and macrostrain were also evaluated and are reported in this study. UV–Vis spectroscopy studies reveal the film’s optical parameters, which provided insights into transmittance, absorption coefficient, and extinction coefficient. The optical band gap was determined from the absorption spectra, with values ranging from 2.60 eV for the as-deposited film to 2.22 eV for the film annealed at 400 °C. The observed reduction in band gap with increasing annealing temperature is attributed to decreased defect density and enhanced crystallinity..

Keywords

Spin coating, XRD, UV-Vis Spectroscopy.

Submitted at: Oct. 10, 2025
Accepted at: April 6, 2026

Citation

S. NITHYA, R. SENGODAN, Effect of annealing temperature on structural and optical properties of ZnO thin films deposited by spin coating method for optoelectronic devices applications, Journal of Optoelectronics and Advanced Materials Vol. 28, Iss. 3-4, pp. 170-177 (2026)