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SYED MANSOOR ALI1,* , S.A. AL SALMAN1, S.S. AL-GHAMDI1, M. S. AL GARAWI1, M. R. BAIG1, TURKI S. ALKHURAIJI2
- URKI S. ALKHURAIJIb aDepartment of Physics and Astronomy, College of Science, P.O BOX 2455 King Saud University Riyadh 11451 Saudi Arabia
- National Center for Irradiation Technology, King Abdulaziz City for Science & Technology, Saudi Arabia
In this work, Titanium dioxide (TiO2) thin films were prepared by atomic layer deposition (ALD). The effect of different substrates on the structural and optical properties of TiO2 thin films was studied. The prepared films were characterized by X – Ray diffraction (XRD) method, reflectance spectroscopy, Photoluminescence (PL) spectroscopy, Field Effect Scanning Electron Microscopy (FESEM) and Energy Dispersive X – Ray (EDX).The XRD results show that the anatase and rutile mixed crystalline TiO2 structure for each substrate. The stoichiometric ratio of the film was confirmed by EDX analysis. The room temperature PL spectra of TiO2 thin films show the band gap and defect peak at 409 nm and 420 nm with excitation at 325 nm. The surface morphology shows that TiO2 on FTO have high roughness as compared to others with irregular particles..
Atomic layer deposition, XRD, FESEM, Photoluminescence, Refractive index.
Submitted at: Nov. 30, 2015
Accepted at: Aug. 3, 2016
SYED MANSOOR ALI, S.A. AL SALMAN, S.S. AL-GHAMDI, M. S. AL GARAWI, M. R. BAIG, TURKI S. ALKHURAIJI, Effects of different substrate on the structural and optical properties of atomic layer deposited TiO2 thin films, Journal of Optoelectronics and Advanced Materials Vol. 18, Iss. 7-8, pp. 666-671 (2016)
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