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Effects of hydrogen plasma treatment on structural and optical properties of Ga2O3 sputtered films

JINGWEI DU1, LEI FENG1, TIANTIAN LI1, JUN ZHU1,* , SIHUA HA2, HAI ZHANG2

Affiliation

  1. School of Physical Science and Technology, Inner Mongolia University, Hohhot 010021, People’s Republic of China
  2. College of Sciences, Inner Mongolia University of Technology, Hohhot 010051, People’s Republic of China

Abstract

The effects of hydrogen plasma treatment on the structural and optical properties of Ga2O3 thin films made by magnetron sputtering have been investigated in this work. Amorphous Ga2O3 films, which were sputtered at room temperature, will turn into β-Ga2O3 polycrystalline ones after thermal annealing in vacuum and the film crystallinity can be further improved by hydrogen plasma treatment. Because of the etching effect, the films became rougher leading to a little decrease of transmittance especially in the UV waveband. More oxygen vacancies were generated by hydrogen plasma as the temperature increases during plasma treatment. This study provides a means to achieve high-quality β-Ga2O3 ultraviolet transparent conductive films for optoelectronic device applications..

Keywords

Ga2O3, Hydrogen plasma, Annealing, Transmittance.

Submitted at: Nov. 22, 2022
Accepted at: April 10, 2024

Citation

JINGWEI DU, LEI FENG, TIANTIAN LI, JUN ZHU, SIHUA HA, HAI ZHANG, Effects of hydrogen plasma treatment on structural and optical properties of Ga2O3 sputtered films, Journal of Optoelectronics and Advanced Materials Vol. 26, Iss. 3-4, pp. 129-134 (2024)