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S. BILGE OCAK1,* , A. B. SELÇUK2, G. KAHRAMAN2, A. H. SELÇUK3
Affiliation
- Gazi University, Atatürk M.Y.O., Çubuk, Ankara
- Sarakoy Nuclear Research and Training Centre, 06983 Saray, Kazan, Ankara, Turkey
- Balıkesir Univertsity, Faculty of Engineering, Electrical and Electronics Engineering Department, Turkey
Abstract
Al/Maleic Anhydride (MA)/p-Si metal-polymer-semiconductor (MPS) structures were prepared on p-Si substrate by spin coating and these MPS structures had a good rectifying behavior. The capacitance-voltage (C-V) and conductance-voltage (G-V) characteristics of Al/MA/p-Si structures were investigated in the frequency (f) range of 1kHz-10MHz at room temperature. The parameters of diodes such as ideality factor, series resistance, barrier height and flat band barrier height were calculated from the forward bias I-V characteristics. The investigation of interface states density and series resistance from capacitance-voltage (C-V) and conductance-voltage (G-V) characteristics in the MPS structures with thin interfacial insulator layer have been reported in order to explain the electrical characteristics of metal/polymer/semiconductor (MPS) with Maleic anhydride (MA) interface. The values of interface states density Dit and series resistance Rs were calculated from measurements of C and G. The values of interface states density Dit and series resistance Rs were calculated from measurements of C and G. These values of Dit and Rs were responsible for the non-ideal behavior of I-V and C-V characteristics. TheI-V, C-V-f and G-V-f characteristics confirm that the barrier height, Dit and Rs of the diode are shown parameters that strongly dependent on the electrical parameters in the MPS structures..
Keywords
Schottky barrier, Ideality factor, Series resistance, Interfaces, Organic compounds, Electrical properties.
Submitted at: Sept. 5, 2013
Accepted at: July 10, 2014
Citation
S. BILGE OCAK, A. B. SELÇUK, G. KAHRAMAN, A. H. SELÇUK, Electrical characteristics of a Schottky device based on maleic anhydride deposited on p-type silicon by spin coating technique, Journal of Optoelectronics and Advanced Materials Vol. 16, Iss. 7-8, pp. 956-963 (2014)
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