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Electrical study of alumina properties as a function of the deposition rate and the layers thickn

A. TALBI1,* , M. A. BENAMARA1, Z. BENAMARA1, B. AKKAL1, M. TALBI2, B. GRUZZA3, C. ROBERT-GOUMET3, L. BIDEUX3

Affiliation

  1. Laboratoire de Micro-électronique Appliquée, Département d’électronique, Faculté de Technologie 22000, Sidi Bel Abbés, Algérie.
  2. Faculté de Médecine, Département de médecine,-22000, Sidi Bel Abbés, Algérie.
  3. Laboratoire des Sciences des Matériaux pour l’Electronique et d’Automatique, Université Blaise Pascal de Clermont II, les Cézeaux, 63177 Aubière, Cedex, France.

Abstract

In this work, we have analyzed the electrical properties of different layers of alumina deposited on silicon substrate, depending on several experimental parameters. Then, the rate of deposition and the thickness of these dielectric layers are studied. Insulator layer surfaces were characterized by elastic peak electron spectroscopy (E.P.E.S) and X rays photoelectron spectroscopy (X.P.S). These control methods are necessary because the variation of the stoichiometry and of the electronic structure of alumina play an important role in the growth and the stability of the metal overlayers of the MIS structure. Concerning the interface quality, we have observed that a deposition rate equal to 32 nm/h seems to be less convenient than for a smaller one. The great rate deposition induces a number of defects at the insulator /semiconductor interface and in the insulator. The quantities of charges QT in the insulator for deposition rates of 1.2 nm/h and 32 nm/h are evaluated to 1011charges per cm2 and 4.33×1012 charges per cm2 , respectively. The values of the interfacial densities of states Nss in the midgap for the structures vary between 9.5×1011 eV-1.cm-2 and 1.2×1013 eV-1.cm-2 respectively..

Keywords

: Alumina - XPS - Electrical measurements - MIS - deposition rate.

Submitted at: April 17, 2013
Accepted at: June 12, 2013

Citation

A. TALBI, M. A. BENAMARA, Z. BENAMARA, B. AKKAL, M. TALBI, B. GRUZZA, C. ROBERT-GOUMET, L. BIDEUX, Electrical study of alumina properties as a function of the deposition rate and the layers thickn, Journal of Optoelectronics and Advanced Materials Vol. 15, Iss. 5-6, pp. 514-518 (2013)