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S. YADAV1,* , S. KUMARI2, S. K CHAUDHARY1, D. MOHAN2, M. BARALA2, A. K. YADAV3, R. DHAR2
- Dept. of Physics, Baba Mastnath University Asthal Bohar, Rohtak-124001 , Haryana , India
- Dept of Physics, G. J. U. S. & T. Hisar-125001, Haryana , India
- Dept of Physics, Chaudhary Charan Singh University of Meerut-250001, UP, India
During the present work of investigations, tin oxide films of ~800 nm thickness are grown on glass substrates by using thermal deposition technique. Refractive Index, absorption co-efficient and band gap of the thin film samples are determined. The films were exposed with short UV radiations and results of thickness measurement are compared with stylus profiler for both as-deposited and UV exposed thin films. Surface morphology of thinfilms was found to be improved on UV exposure. The Nonlinear index of refraction (n2) is estimated by Miller Rule and it is observed that after short UV exposure, Nonlinear refractive index changes from 9.4287×10-12 cm2/W to 1.1720×10-11 cm2/W. The third order nonlinear susceptibility (χ(3)) is measured using semi-empirical formula and found to change slightly from 1.3637×10-12 esu to 1.5643×10-12 esu after UV exposure of the films..
Nonlinear refractive index; third order nonlinear susceptibility; Thermal deposition.
Submitted at: Dec. 3, 2019
Accepted at: Aug. 18, 2020
S. YADAV, S. KUMARI, S. K CHAUDHARY, D. MOHAN, M. BARALA, A. K. YADAV, R. DHAR, Estimation of optical parameters in tin oxide thin films by UV exposure for photonic applications, Journal of Optoelectronics and Advanced Materials Vol. 22, Iss. 7-8, pp. 379-383 (2020)
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