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Grain size effect on the growth of LiCoO2 thin film cathodes

M. C. RAO1

Affiliation

  1. Reader in Physics, Andhra Loyola College, Vijayawada – 520 008, Andhra Pradesh, India

Abstract

Thin films of LiCoO2 were grown by pulsed laser deposition technique on silicon substrates. Microstructural properties were studied with respect to their deposition parameters i.e. substrate temperature (Ts), oxygen partial pressure (pO2) and target composition in the deposition chamber. The atomic force microscopy (AFM) data demonstrated that the pulsed laser deposited LiCoO2 thin films are homogeneous and uniform with regard to the surface topography. For the film deposited at 300 0 C in oxygen partial pressure of 100 mTorr (prepared from target with 15% Li2O) is composed of roughly spherical grains of varying sizes and the average grain size is estimated. The root mean square surface roughness of the films derived from AFM data is 8 nm. The grain size increased with the increase of substrate temperature. The increase in grain size with deposition temperature is clearly observed in AFM data and found to be around 210 nm for the films deposited at 700 0 C. The surface morphological features of pulsed laser deposited films grown at various substrate temperatures were also studied by scanning electron microscopy and the results are compared with AFM data..

Keywords

LiCoO2 thin films, PLD, AFM, SEM.

Submitted at: Jan. 10, 2011
Accepted at: April 11, 2011

Citation

M. C. RAO, Grain size effect on the growth of LiCoO2 thin film cathodes, Journal of Optoelectronics and Advanced Materials Vol. 13, Iss. 4, pp. 428-431 (2011)