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High-aspect-ratio structures produced by two-photon photopolimerization

F. JIPA1, M. ZAMFIRESCU1,* , C. LUCULESCU1, R. DABU1

Affiliation

  1. National Institute for Laser Plasma and Radiation Physics - INFLPR, Atomiştilor 409, 077125 Măgurele, Bucharest, Romania

Abstract

In this work microstructures with high-aspect-ratio were produced by two-photon photopolymerization technique in SU-8 photoresist. When micrometer or submicrometer size features are realized, the standard protocol for processing the photoresist has to be adapted to the dimension of the desired structures. Using the suitable parameters of the protocol for exposure and development of the photopolymer, microstructures with aspect-ration more than 10:1 were obtained..

Keywords

Two-photon absorption, Photonic structures, Photopolymers, SU-8, Aspect-ratio.

Submitted at: Dec. 15, 2009
Accepted at: Jan. 20, 2010

Citation

F. JIPA, M. ZAMFIRESCU, C. LUCULESCU, R. DABU, High-aspect-ratio structures produced by two-photon photopolimerization, Journal of Optoelectronics and Advanced Materials Vol. 12, Iss. 1, pp. 124-128 (2010)