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Improvement in crystallinity of annealed V2O5 thin films deposited by spin coating technique for optoelectronic device applications

S. NITHYA1, R. SENGODAN1,*

Affiliation

  1. Department of Physics, Kumaraguru College of Technology, Coimbatore-49, India

Abstract

Vanadium Pentoxide (V2O5) thin films were coated on a well cleaned glass substrate by spin coating technique. The coated films were characterized by XRD, EDS, SEM and UV – Vis. EDS is used to determine the elemental composition of a sample. By detecting the characteristic X-rays emitted by elements when they are excited by an electron beam, we can identify the elements present in V2O5 thin films and quantify their relative concentrations. SEM provides high-resolution images of the surface morphology of V2O5 thin films. This helps us to understand the surface features, such as roughness, grain size, and overall texture. XRD patterns revealed that the as a deposited film is in amorphous nature and annealed films is the polycrystalline nature with orthorhombic phase. UV-Vis spectra is used to explore the optical properties of the material, including transmittance, absorption coefficient, and extinction coefficient. From the absorption spectrum, the band gap energy of the material is calculated. The band gap of films is found to be 1.44 eV to 1.21 eV as deposited and annealed at 150 °C and 350 °C. The band gap values are decreased with increasing annealing temperature..

Keywords

Spin coating, XRD, Grain size, Band gap energy.

Submitted at: Nov. 16, 2023
Accepted at: June 3, 2024

Citation

S. NITHYA, R. SENGODAN, Improvement in crystallinity of annealed V2O5 thin films deposited by spin coating technique for optoelectronic device applications, Journal of Optoelectronics and Advanced Materials Vol. 26, Iss. 5-6, pp. 246-253 (2024)