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Influence of organic additive Thiourea on the properties of hard magnetic CoMnP thin film alloys electrodeposited from chloride bath

M. R. M. KRISHNAPPA1,* , N. RAJASEKARAN2, S. GANESAN3, R. N. EMERSON4

Affiliation

  1. Department of Physics, Sri Ramakrishna Engineering College, Coimbatore – 641 022,India
  2. Department of Chemistry, Sri Ramakrishna Engineering College, Coimbatore – 641 022,India
  3. Department of Physics, Government College of Technology, Coimbatore – 641 013,India
  4. Department of Physics, Government Arts College, Udhagamandalam – 643 002,India

Abstract

Thin films of CoMnP alloy have been deposited by electrodeposition technique on copper substrate with different concentration of NaH2PO2 and Thiourea in the chemical bath to investigate the structural and magnetic properties of CoMnP compounds. The structural and surface morphology of the film were detected using X-ray diffractogram (XRD) and Scanning electron Microscope (SEM) respectively. The constitutions in the film were determined by Energy Dispersive XRay Spectroscopy (EDS) technique. The magnetic properties such as the coercivity and the magnetic saturation of the films were studied with the help of Vibrating Sample Magnetometer (VSM). The deposit were found to be smooth, nanocrystalline and with good adherence to the copper substrate. The increase in the NaH2PO2 and Thiourea concentration in the bath causes a decrease in Mn content and increase in the P content of the film. Among the different compositions, CoMnP compound exhibit good hard magnetic properties, under the best condition involving addition of 0.2M of NaH2PO2 and 2 gL-1 of Thiourea at a current density of 7 mA-cm-2 and time of deposition 60 minutes, the thickness of the film was found to be 3.3 micrometer with coercivity 1550 Oe and remanent 0.68 emu..

Keywords

Electrodeposition, CoMnP thin films, Organic additive Thiourea, EDS, XRD, SEM.

Submitted at: Aug. 14, 2010
Accepted at: Sept. 15, 2010

Citation

M. R. M. KRISHNAPPA, N. RAJASEKARAN, S. GANESAN, R. N. EMERSON, Influence of organic additive Thiourea on the properties of hard magnetic CoMnP thin film alloys electrodeposited from chloride bath, Journal of Optoelectronics and Advanced Materials Vol. 12, Iss. 9, pp. 1863-1868 (2010)