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Ion-implantation of erbium into the nanocrystalline diamond thin films

P. NEKVINDOVÁ1, O. BABCHENKO2, J. CAJZL1, A. KROMKA2, A. MACKOVÁ3,4, P. MALINSKÝ3,4, J. OSWALD2, V. PRAJZLER2,5, Z. REMEŠ2, M. VARGA2

Affiliation

  1. Department of Inorganic Chemistry, University of Chemistry and Technology, Prague 166 28, Czech Republic
  2. Institute of Physics, Academy of Sciences of the Czech Republic, v.v.i., Cukrovarnická 10, 162 00 Prague, Czech Republic
  3. Nuclear Physics Institute, Academy of Sciences of the Czech Republic, v.v.i., 250 68 Řež, Czech Republic
  4. Department of Physics, Faculty of Science, J. E. Purkinje University, České mládeže 8, 400 96 Ústí nad Labem, Czech Republic
  5. Department of Microelectronics, Faculty of Electrical Engineering, Czech Technical University in Prague, Technická 2, 166 27 Prague 6, Czech Republic

Abstract

High-refractive-index nanocrystalline diamond films deposited on borosilicate glass from a CH4/CO2/H2 gas mixture by a linear-antenna microwave plasma-enhanced chemical vapour deposition (MW PECVD) were doped by erbium using ionimplantation technique. The prepared thin films guided an optical signal in the range of 632–1552 nm and revealed measurable luminescence around 1530 nm. The changes of optical properties and surface morphology were studied more in detail..

Keywords

Nanocrystalline diamond, Optical waveguides, Erbium, Luminescence, Ion implantation, CVD.

Submitted at: April 4, 2016
Accepted at: Aug. 3, 2016

Citation

P. NEKVINDOVÁ, O. BABCHENKO, J. CAJZL, A. KROMKA, A. MACKOVÁ, P. MALINSKÝ, J. OSWALD, V. PRAJZLER, Z. REMEŠ, M. VARGA, Ion-implantation of erbium into the nanocrystalline diamond thin films, Journal of Optoelectronics and Advanced Materials Vol. 18, Iss. 7-8, pp. 679-684 (2016)