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F. LIMBACH1,* , E. O. SCHÄFER-NOLTE1, R. CATERINO1, T. GOTSCHKE1, T. STOICA1, E. SUTTER2, R. CALARCO1
Affiliation
- Institute of Bio- and Nanosystems (IBN-1), Research Centre Jülich GmbH, 52425 Jülich, Germany, and JARA-FIT Fundamentals of Future Information Technology
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973
Abstract
The influence of the substrate temperature and Mg doping on the morphological and optical properties of catalyst-free GaN nanowires grown by plasma-assisted molecular beam epitaxy on Si(111) has been investigated in a large temperature range between 665°C and 785°C. The density and wire sizes in Mg-doped nanowires are found to change with substrate temperature in a similar way as undoped nanowires. Between 725 °C and 785 °C a trimodal size distribution and an increase of the wire density from 5.0×109 cm-2 to 9.5×109 cm-2 were observed. Transmission electron microscopy indicates that the upper parts of the nanowires are free of structural defects. Raman spectroscopy measurements confirm a high crystalline quality of doped wires, with a line width of the E2 H of 3.3 cm-1 for samples grown at Ts=785 °C. Photoluminescence measurements show a strong influence of Mg on the emission properties, namely the increase of the donor-acceptor pair emission and its phonon replicas..
Keywords
GaN, MG-doping, Nanowire, MBE, Photo-luminescence.
Submitted at: April 30, 2010
Accepted at: June 16, 2010
Citation
F. LIMBACH, E. O. SCHÄFER-NOLTE, R. CATERINO, T. GOTSCHKE, T. STOICA, E. SUTTER, R. CALARCO, Morphology and optical properties of Mg doped GaN nanowires in dependence of growth temperature, Journal of Optoelectronics and Advanced Materials Vol. 12, Iss. 6, pp. 1433-1441 (2010)
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