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DINESH SINGH RANA1,* , D. K. CHATURVEDI1, J. K. QUAMARA2
Affiliation
- Institute of Instrumentation Engineering, Kurukshetra University, Kurukshetra-136119
- Department of Physics, National institute of Technology, Kurukshetra-136119
Abstract
Thin films (12 µm) of polyvinylidene fluoride (PVDF) were irradiated with 100 MeV Ag- ion beam at fluence 1.875X1011 ion/cm2. The changes in physical, chemical, and surface morphological properties of irradiated films have been investigated using X-ray diffraction (XRD), Fourier Transform Infrared Spectroscopy(FTIR), Field emission scanning electron microscopy (FESEM) and Energy Dispersive Analysis by X-ray (EDAX) techniques by taking unirradiated (pristine) film as reference. The diffraction pattern of PVDF films shows this polymer is in semi-crystalline form and posses crystalline α-, β-, and γ- phases. A decrease in the crystallinity and increase in crystallite size has been observed due to 100 MeV Ag -ion irradiation. Using XRD data, the degree of crystallinity, crystallite size and other structural parameters such as micro strain and dislocation density of pristine and irradiated films have been estimated. In the FTIR spectra, no appreciable change in characteristic bands has been observed after irradiation, indicating that PVDF is chemically stable. EDAX result shows that the relative chemical composition of PVDF is invariant under energetic heavy ion irradiation. FESEM analysis show granular microstructure with increase in grain size and porosity upon ion irradiation..
Keywords
SHI, PVDF, FTIR, XRD, FWHM, EDAX, FESEM.
Submitted at: Feb. 23, 2009
Accepted at: May 28, 2009
Citation
DINESH SINGH RANA, D. K. CHATURVEDI, J. K. QUAMARA, Morphology, crystalline structure, and chemical properties of 100 MeV Ag- ion beam irradiated polyvinylidene fluoride (PVDF) thin film, Journal of Optoelectronics and Advanced Materials Vol. 11, Iss. 5, pp. 705-712 (2009)
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