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Nano-scale height manipulation in sputter-deposited photolithographic patterns

TANIA DEY1

Affiliation

  1. A sequential combination of thermal oxide growth, photolithography, buffered hydrogen fluoride (BHF) etch, sputter deposition and lift-off process were used to produce square-shaped nano-islands of go

Abstract

A sequential combination of thermal oxide growth, photolithography, buffered hydrogen fluoride (BHF) etch, sputter deposition and lift-off process were used to produce square-shaped nano-islands of gold and silica grid patterns on a doped silicon support. This nanofabricated surface was characterized by profilometry, optical microscopy, atomic force microscopy (AFM) and cyclic voltammetry (CV). The height difference between gold and silica was tailored to be ~ 35 nm. This kind of chip can be used as bio-sensors for detecting various metalloproteins grafted on gold islands, as well as caged analyte molecules inside the protein, from their corresponding electrochemical read-out..

Keywords

Photolithography, BHF etching, Sputter deposition, Nanofabrication and biosensor.

Submitted at: Feb. 24, 2011
Accepted at: March 16, 2011

Citation

TANIA DEY, Nano-scale height manipulation in sputter-deposited photolithographic patterns, Journal of Optoelectronics and Advanced Materials Vol. 13, Iss. 3, pp. 251-254 (2011)